The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 2026
Filed:
May. 21, 2024
Applicant:
Advanced Energy Industries, Inc., Denver, CO (US);
Inventor:
Hien Minh Nguyen, Longmont, CO (US);
Assignee:
Advanced Energy Industries, Inc., Denver, CO (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H02M 3/155 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32174 (2013.01); H02M 3/155 (2013.01);
Abstract
Bias supplies and plasma processing systems are disclosed. One bias supply comprises an output node, a return node, and a switch network and at least one power supply coupled to the output node and the return node. The switch network and the at least one power supply configured, in combination, to apply an asymmetric periodic voltage waveform and provide a corresponding current waveform at the output node relative to the return node.
Nguyen, Hien. (2026). Bias supply control and data processing (U.S. Patent No. 12763287). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12763287
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile