The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 13, 2026

Filed:

Jan. 12, 2021
Applicant:

Hitachi High-tech Corporation, Tokyo, JP;

Inventors:

Hirokazu Tamaki, Tokyo, JP;

Yudai Kubo, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/153 (2006.01); H01J 37/141 (2006.01); H01J 37/147 (2006.01);
U.S. Cl.
CPC ...
H01J 37/153 (2013.01); H01J 37/141 (2013.01); H01J 37/1471 (2013.01); H01J 2237/1534 (2013.01);
Abstract

An aberration corrector includes: a first multipole and a second multipole configured to form a hexapole field; and a transfer optics including a plurality of round lenses. The transfer optics is disposed between the first multipole and the second multipole, and acts on a charged particle beam such that an absolute value of a slope of the charged particle beam passing through the first multipole is different from an absolute value of a slope of the charged particle beam passing through the second multipole.


Find Patent Forward Citations

Tamaki, Hirokazu. (2026). Aberration corrector and electron microscope (U.S. Patent No. 12763280). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12763280

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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