The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 2026
Filed:
Mar. 25, 2025
Tata Consultancy Services Limited, Mumbai, IN;
Karan Rajesh Bhavsar, Thane, IN;
Pankaj Harish Doke, Thane, IN;
Sujit Raghunath Shinde, Thane, IN;
Sanjay Madhukar Kimbahune, Thane, IN;
TATA CONSULTANCY SERVICES LIMITED, Mumbai, IN;
Abstract
There are technical challenges to address the technical capability limitations of a Basic Emergent User (BEU) to enable and assist in generating high entropy passphrases but are easier for recall. Generation usable high entropy passphrases in local language from personalized intersection corpus for device authentication set up for BEU is provided. A recallable phrase, spoken by the BEU in local language, is converted to a text and Seed List Words (SLWs) are filtered based on a pre-generated personalized intersection corpus. Passphrase distance matrix is generated for the SLWs using the personalized intersection corpus. Words associated with each SLW are arranged in descending order of vector distance or entropy. Words of same order are concatenated in for each SLW to generate passphrase corpus. Randomly selected passphrases are read out and displayed on the user device by positioning the highest entropy based on usability of display screen in context of the user.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile