The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 2026
Filed:
Jun. 19, 2023
Microsoft Technology Licensing, Llc, Redmond, WA (US);
Saurabh Agarwal, Redmond, WA (US);
Abhisek Pan, Bellevue, WA (US);
Brendon Machado, Seattle, WA (US);
David Allen Dion, Bothell, WA (US);
Ishai Menache, Redmond, WA (US);
Karthikeyan Subramanian, Redmond, WA (US);
Luke Jonathon Marshall, Redmond, WA (US);
Neha Keshari, Bothell, WA (US);
Thomas Moscibroda, Bellevue, WA (US);
Yiran Wei, Kirkland, WA (US);
Microsoft Technology Licensing, LLC, Redmond, WA (US);
Abstract
A search space for allocating a virtual machine is pruned. An allocation request for allocating a virtual machine to a plurality of clusters is received. A valid set of clusters is generated. The valid set of clusters includes clusters of the plurality of clusters that satisfy the allocation request. An attribute associated with the allocation request is identified. A truncation parameter is determined, by a trained search space classification model, based on the identified attribute. The valid set of clusters is filtered based on the truncation parameter. A server is selected from the filtered valid set of clusters. The virtual machine is allocated to the selected server. In an aspect of the disclosure, a search space pruner generates an analysis summary based on an analysis of received telemetry data. The search space pruner trains the search space classification model to determine truncation parameters based on the analysis summary.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile