Generating whole substrate drop patterns with repeating evaluation regions

Abstract

N whole substrate drop patterns are generated. Each of the N whole substrate drop pattern has M repeating drop patterns in repeating evaluation regions of a test substrate with predetermined dimensions and corresponding to a film to be formed from each of the N whole substrate drop patterns on test substrate. P statistical parameters of Q distributions of physical attributes of the M repeating drop patterns are calculated. The Q physical attributes are related to a thickness of a top layer of the film above substrate features. N figures of merit from the P statistical parameters corresponding to the N whole substrate drop patterns are determined. From the N whole substrate drop patterns, a satisfactory drop pattern that has a satisfactory figure of merit is selected among the N figures of merit. N, M, P, and Q are positive integers.