The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 13, 2026

Filed:

Sep. 05, 2024
Applicant:

Corning Incorporated, Corning, NY (US);

Inventors:

Ryan Claude Andrews, Elmira, NY (US);

David Matthew Berg, Rochester, NY (US);

Pierre Michel Bouzi, Manassas, VA (US);

William John Furnas, Elmira, NY (US);

Jacob Immerman, Corning, NY (US);

Jeremiah Robert Jacobson, Cambridge, MA (US);

Katherine Anne Lindberg, Corning, NY (US);

Andrew Allen Lindstrand, Big Flats, NY (US);

Glenn Abram Newcomer, Pine City, NY (US);

Evan Lewis Olson, Elmira, NY (US);

Babak Robert Raj, Corning, NY (US);

Nathaniel David Wetmore, Corning, NY (US);

Assignee:

CORNING INCORPORATED, Corning, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01L 1/24 (2006.01); G01J 3/14 (2006.01); G01J 4/02 (2006.01); G01N 21/21 (2006.01); G01N 21/47 (2006.01);
U.S. Cl.
CPC ...
G01L 1/241 (2013.01); G01J 3/14 (2013.01); G01J 4/02 (2013.01); G01N 21/21 (2013.01); G01N 21/47 (2013.01); G01N 2021/4792 (2013.01);
Abstract

Apparatus includes a sample holder with a cavity and a plurality of devices configured to hold a curvature of a curved substrate in a fixed configuration. Apparatus includes two prisms with a viewing apparatus of the sample holder configured to translate therebetween. Methods can include disposing the curved substrate in the sample holder, transmitting a first beam, translating the sample holder, and transmitting a second beam. Alternatively, apparatus include a light scattering-polarimetry sub-system configured to emit a first beam to impinge an end surface of coupling prism and detect at least a portion of the first beam impinging the first surface of the coupling prism. The apparatus includes an evanescent prism coupling spectroscopy sub-system configured to emit a second beam to impinge a first surface of the coupling system and detect at least a portion of the second beam impinging the second surface of the coupling prism.


Find Patent Forward Citations

Andrews, Ryan. (2026). Methods and apparatus of determining a stress-related characteristic of a substrate (U.S. Patent No. 12761095). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12761095

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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