The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 13, 2026

Filed:

Jul. 01, 2024
Applicant:

Delta Electronics, Inc., Taoyuan City, TW;

Inventors:

Wen-Shiang Chen, Taoyuan City, TW;

Ting-Yuan Wu, Taoyuan City, TW;

Assignee:

DELTA ELECTRONICS, INC., Taoyuan City, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F28D 15/04 (2006.01);
U.S. Cl.
CPC ...
F28D 15/046 (2013.01);
Abstract

A vapor chamber includes a first plate body, a second plate body, a capillary structure, and a first thin capillary layer. The second plate body is disposed below the first plate body. The first plate body and the second plate body form a closed cavity. The capillary structure is disposed within the closed cavity. The capillary structure includes at least one column and at least one strip. The at least one strip has an opposite first surface and a second surface. The first surface faces the first plate body or the second plate body, and the at least one strip has a plurality of first grooves that are recessed from the first surface toward the second surface. The first thin capillary layer is disposed between the second plate body and the capillary structure.


Find Patent Forward Citations

Chen, Wen-Shiang. (2026). Vapor chamber (U.S. Patent No. 12760973). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12760973

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…