The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 13, 2026

Filed:

Apr. 27, 2023
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Zhepeng Cong, San Jose, CA (US);

Nimrod Smith, Cupertino, CA (US);

Ala Moradian, Sunnyvale, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/46 (2006.01); C23C 16/455 (2006.01); C30B 25/10 (2006.01); C30B 25/14 (2006.01); H10P 72/76 (2026.01);
U.S. Cl.
CPC ...
C30B 25/14 (2013.01); C23C 16/45502 (2013.01); C23C 16/46 (2013.01); C30B 25/10 (2013.01); H10P 72/7624 (2026.01);
Abstract

The present disclosure relates to methods and devices for processing substrates, suitable for use in semiconductor manufacturing. The method includes heating a substrate positioned on a substrate support. The method includes moving an isolation plate adjust one or more of: a height of the isolation plate, or an angle of the isolation plate such that the isolation plate moves to a non-parallel orientation relative to the substrate. The method includes flowing one or more process gases over the substrate to deposit a material on the substrate, the flowing of the one or more process gases over the substrate including guiding the one or more process gases through one or more flow paths defined at least in part by a space between the isolation plate and the substrate.


Find Patent Forward Citations

Cong, Zhepeng. (2026). Epi isolation plate with gap and angle adjustment for process tuning (U.S. Patent No. 12760441). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12760441

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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