The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 2026
Filed:
Mar. 17, 2022
Lam Research Corporation, Fremont, CA (US);
Jeremy Jerome Pool, Sherwood, OR (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
Nozzles for providing gas into a semiconductor wafer process chamber are disclosed. The nozzles may include a deflector structure that has a surface facing the nozzle outlet so as to redirect gas as it enters a chamber. The nozzles may also have a cooling system to remove heat provided to the deflector structure through the flow of plasma through the nozzle. The deflector structure may be used to distribute the plasma flowed therethrough in a more evenly distributed manner, thereby protecting hardware within the process chamber from potential hotspots. This has the further effect of redirecting gases more efficiently throughout the chamber.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile