The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 2026
Filed:
Dec. 16, 2021
Solayer Gmbh, Karlstein, DE;
Jens Hergenröther, Gross-Zimmern, DE;
Andreas Rack, Großkrotzenburg, DE;
Florian Schwarz, Aschaffenburg, DE;
Peter Rettenbacher, Frankfurt, DE;
Thomas Merz, Aschaffenburg, DE;
Solayer GmbH, Karlstein, DE;
Abstract
A method for changing test substrates in a continuous-flow vacuum system in a multiple-treatment-step process cycle for treating a substrate, a treatment method using the method for changing test substrates, and systems for treating a plurality of substrates () and for changing test substrates. For at least two treatment steps, at least two test substrates () are transferred to a vacuum treatment system at the beginning of the process cycle and are transferred back out once the process cycle is concluded. Subsequently, the first test substrate () concurrently treated in this step is removed from the measurement position () it occupied during the treatment and is deposited in an empty position () without a test substrate (). Subsequently, the second test substrate () which has not been treated yet is deposited in the resulting free measurement position () for the purpose of supplying the second test substrate to the subsequent treatment step.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile