The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 2026
Filed:
Dec. 06, 2021
The Board of Trustees of the University of Illinois, Urbana, IL (US);
Jeffrey S. Moore, Savoy, IL (US);
Philippe H. Geubelle, Champaign, IL (US);
Nancy R. Sottos, Champaign, IL (US);
Elizabeth C. Firestone, Midland, MI (US);
Evan M. Lloyd, Maryville, IL (US);
The Board of Trustees of the University of Illinois, Urbana, IL (US);
Abstract
A method of spontaneously patterning a polymer during frontal polymerization includes activating an initiation region of a monomer solution to reaction to initiate a polymerization reaction. A polymerization front is generated and propagates through the monomer solution in a radial or longitudinal direction away from the initiation region. The monomer solution is spontaneously heated downstream of the polymerization front by thermal transport away from the polymerization reaction. Once a localized region of the monomer solution reaches a temperature sufficient for spontaneous initiation of another polymerization reaction, a new polymerization front is generated and propagates through the monomer solution in a circumferential or transverse direction. The spontaneous heating of the monomer solution downstream of the polymerization front and the initiation of another polymerization reaction occurs cyclically, producing multiple new polymerization fronts and spatial variations in reaction temperature across the monomer solution. Once polymerization is complete, a spontaneously patterned polymer is formed.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile