The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 13, 2026

Filed:

Feb. 26, 2021
Applicant:

Osg Corporation, Toyokawa, JP;

Inventors:

Teruya Hisada, Toyokawa, JP;

Takayuki Nakajima, Toyokawa, JP;

Assignee:

OSG CORPORATION, Toyokawa, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23P 15/52 (2006.01); B23G 5/06 (2006.01);
U.S. Cl.
CPC ...
B23P 15/52 (2013.01); B23G 5/06 (2013.01);
Abstract

A method of producing a nitrided cut tap that includes a nitrogen diffusion layer. The method includes (a) a nitriding step for forming the nitrogen diffusion layer in which nitrogen atoms contained in an atmospheric gas are diffused from a surface of a base material of the cut tap under heat, such that the nitrogen diffusion layer has a thickness ranging from 10 μm to 30 μm; and (b) a honing step for rounding a cutting edge portion by colliding abrasive particles against a local part of the cutting edge portion of the base material of the cut tap that has been subjected to the nitriding step, such that a difference between a thickness of the nitrogen diffusion layer in the cutting edge portion and a thickness of the nitrogen diffusion layer in flank and rake surfaces sandwiching the cutting edge portion, is not larger than 5 μm.


Find Patent Forward Citations

Hisada, Teruya. (2026). Nitrided cut tap and production method therefor (U.S. Patent No. 12759100). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12759100

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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