The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 2026
Filed:
Nov. 01, 2022
Samsung Electronics Co., Ltd., Suwon-si, KR;
Jaeil Lee, Hwaseong-si, KR;
Kyoungcho Na, Hwaseong-si, KR;
Samsung Electronics Co., Ltd., Suwon-si, KR;
Abstract
A method of manufacturing a semiconductor device includes forming a first layer on a wafer through a single shot exposure, a single shot of the first layer including first overlay marks; forming a second layer and a first photoresist film on the first layer; and performing an upper shot exposure and a lower shot exposure onto the first photoresist film based on a first overlay function of the single shot of the first layer generated based on absolute measurement of the first overlay marks. An upper shot transferred by the upper shot exposure and a lower shot transferred by the lower shot exposure are identical to each other, and an area of each of the upper shot and the lower shot is less than an area of the single shot of the first layer.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile