The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 06, 2026

Filed:

Dec. 09, 2022
Applicant:

Sumitomo Osaka Cement Co., Ltd., Tokyo, JP;

Inventors:

Satoyoshi Inui, Tokyo, JP;

Taku Ichiyoshi, Tokyo, JP;

Takeshi Otsuka, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10P 72/72 (2026.01);
U.S. Cl.
CPC ...
H10P 72/722 (2026.01);
Abstract

Provided is an electrostatic chuck member including: a dielectric substrate having a placement surface on which a sample is mounted, wherein the dielectric substrate comprises a first supporting plate and a second supporting plate which are stacked in a thickness direction thereof; and an adsorption electrode embedded in the dielectric substrate, in which a gas flow path is provided by a recessed groove, which is provided between the first supporting plate and the second supporting plate which have surfaces facing each other, wherein the recessed groove is formed in at least one of the surfaces thereof and is covered with the other thereof, a dimension of the gas flow path in a height direction is 90 μm or more and 300 μm or less, and a width dimension of the gas flow path is 500 μm or more and less than 3000 μm.


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