The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 2026
Filed:
Dec. 24, 2024
Applicant:
Yang Pan, Singapore, SG;
Inventor:
Yang Pan, Singapore, SG;
Assignee:
Inspiring Atoms Pte Ltd, Singapore, SG;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32174 (2013.01); H01J 37/321 (2013.01); H01J 37/32146 (2013.01);
Abstract
Disclosed herein is a system and method for delivering pulsed RF power from a single generator to multiple loads in semiconductor manufacturing processes. Using a Single-Pole Multi-Throw (SPMT) switch, the controller dynamically selects a load in real time to receive one or a group of pulses. Each pulse is configurable with distinct RF power, frequency, and duration, enabling precise and flexible power allocation to components such as plasma source coils, zonal electrostatic chucks, or multiple reactors.
Pan, Yang. (2026). System and method for delivering pulsed rf power from a single generator to multiple loads (U.S. Patent No. 12755936). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12755936
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile