The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 2026
Filed:
Jun. 03, 2020
Applicant:
Samsung Sdi Co., Ltd., Yongin-si, KR;
Inventor:
Jaebum Lim, Yongin-si, KR;
Assignee:
SAMSUNG SDI CO., LTD., Yongin-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); C07C 43/285 (2006.01); C07D 403/10 (2006.01); G03F 7/004 (2006.01); G03F 7/11 (2006.01);
U.S. Cl.
CPC ...
G03F 7/2016 (2013.01); C07C 43/285 (2013.01); C07D 403/10 (2013.01); G03F 7/0041 (2013.01); G03F 7/11 (2013.01);
Abstract
The present invention relates to a hardmask composition including a compound represented by Chemical Formula 1 and a solvent, a hardmask layer including a cured product of the hardmask composition, and a pattern forming method using the hardmask composition. In Chemical Formula 1, the definitions of A, Rto R, and n are as described in the specification.
Lim, Jaebum. (2026). Hardmask composition, hardmask layer, and pattern forming method (U.S. Patent No. 12754481). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12754481
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile