The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 2026
Filed:
Mar. 31, 2022
Applicant:
The Regents of the University of California, Oakland, CA (US);
Inventor:
Alexander Groisman, San Diego, CA (US);
Assignee:
THE REGENTS OF THE UNIVERSITY OF CALIFORNIA, Oakland, CA (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/201 (2013.01); G03F 7/2004 (2013.01); G03F 7/70725 (2013.01);
Abstract
A photolithography system includes an optical assembly for delivering a collimated light beam with spatially uniform light across the beam to a substrate on a substrate mount. A multi-axis support assembly provides for angular and rotational control of relative positioning of the optical assembly and the substrate mount to allow fabrication of microfeatures with different draft angles.
Groisman, Alexander. (2026). Uv lithography system and method (U.S. Patent No. 12754480). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12754480
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile