The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 2026
Filed:
Sep. 30, 2022
Applicant:
Schott Ag, Mainz, DE;
Inventors:
Clemens Ottermann, Hattersheim, DE;
Frederick Bachhuber, Mainz, DE;
Stefan Weidlich, Mainz-Kastel, DE;
Assignee:
SCHOTT AG, Mainz, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 6/134 (2006.01); F21V 8/00 (2006.01); G02B 26/08 (2006.01); G02B 27/01 (2006.01);
U.S. Cl.
CPC ...
G02B 6/1347 (2013.01); G02B 6/0046 (2013.01); G02B 26/0891 (2013.01); G02B 27/0172 (2013.01);
Abstract
A method for physically modifying at least one of at least one region of a surface of a substrate and at least one portion of the substrate, the substrate comprising a multicomponent glass, the method comprising the steps of: providing an apparatus and the substrate, the apparatus including a radiation source configured for generating a particle beam; feeding the substrate to the apparatus and applying a vacuum; modifying at least one of the at least one region of the surface of the substrate and the at least one portion of the substrate by an exposure to the particle beam.