The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 06, 2026

Filed:

Jan. 24, 2023
Applicant:

Rheinmetall Waffe Munition Gmbh, Südheide, DE;

Inventors:

Markus Jung, Eicklingen, DE;

Thomas Baumgärtel, Celle, DE;

Klaus Ludewigt, Hamburg, DE;

Jürgen Schmitz, Gifhorn, DE;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01S 7/484 (2006.01); G01S 17/10 (2020.01);
U.S. Cl.
CPC ...
G01S 7/484 (2013.01); G01S 17/10 (2013.01);
Abstract

A method is presented for operating a laser radiation device () that has an illumination laser () and an active laser (), and wherein, in a first operating mode of the laser radiation device () in which the active laser () does not emit any active laser radiation (), the illumination laser () is operated in such a way that its illumination laser radiation () has a first illumination laser radiant flux. The method is characterized in that, in a second operating mode of the laser radiation device () in which the active laser () emits active laser radiation (), the illumination laser () is operated such that its illumination laser radiation () has a second illumination laser radiant flux that is greater than the first illumination laser radiant flux.


Find Patent Forward Citations

Jung, Markus. (2026). Methods and devices for reducing eye safety minimum distances in conjunction with illumination laser radiation (U.S. Patent No. 12754295). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12754295

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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