In-situ capacitance detection for integrated circuits and mems sensors

Abstract

Disclosed herein are electronic sensor systems and methods of their operation. The electronic sensor systems contain a micro-electromechanical system (MEMS) for measuring a physical parameter such as rotation, pressure, acceleration, or another physical parameter. The electronic sensor systems also contain an integrated circuit linked with the MEMS. The integrated circuit contains a MEMS sensing circuit that receives outputs from the MEMS through conductors, such as wire bonds or ball joints, at least partially encapsulated in a dielectric. The dielectric may experience environmentally-induced changes to its dielectric constant that may affect a capacitance between a pair of the conductors, which can affect a measurement provided by the MEMS. The integrated circuit contains a compensation circuit that measures a capacitance between a pair of the conductors and provides an adjustment to a measurement provided by the MEMS.