The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 2026
Filed:
Jul. 02, 2024
Uchicago Argonne, Llc, Chicago, IL (US);
UCHICAGO ARGONNE, LLC, Chicago, IL (US);
Abstract
Techniques for improving critical dimension metrology are disclosed herein. An example method includes emitting a radiation beam comprising (i) a primary beam that passes through a sample and scatters into a set of scattered beams and (ii) a reference beam. The method further includes detecting the reference beam and a portion of the set of scattered beams, wherein the reference beam and the portion of the set of scattered beams superimpose at the detector as a hologram of the sample to encode structural information associated with at least one lithographic pattern of the sample. The method further includes executing a dimensioning algorithm configured to: determine one or more critical dimensions of the sample based on one or more properties of the hologram and reconstruct a real-space image of the sample based on the hologram. The method further includes causing the critical dimensions or the real-space image to be displayed.