The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 06, 2026

Filed:

Aug. 30, 2023
Applicant:

Asm Ip Holding, B.v., Almere, NL;

Inventor:

Glenn Holbrook, Scottsdale, AZ (US);

Assignee:

ASM IP Holding B.V., Almere, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 16/44 (2006.01); C23C 16/448 (2006.01); G05D 7/06 (2006.01); H01J 37/32 (2006.01); H10P 72/00 (2026.01);
U.S. Cl.
CPC ...
C23C 16/45561 (2013.01); C23C 16/4408 (2013.01); C23C 16/45589 (2013.01); G05D 7/0635 (2013.01); H01J 37/32449 (2013.01); H01J 37/32871 (2013.01); C23C 16/4412 (2013.01); C23C 16/4481 (2013.01); H10P 72/0402 (2026.01);
Abstract

A flow control arrangement includes a source conduit, a supply conduit, a shutoff valve, and a slow-close actuator. The shutoff valve connects the source conduit to the supply conduit. The slow-close actuator is connected to the shutoff valve to close the shutoff valve during a slow-close interval, the pyrophoric material detector is operably connected to the slow-close actuator to close the shutoff valve upon detection of a metastable mass of a pyrophoric material outside of the flow control arrangement, and the slow-close interval is sized to limit shock communicated to the metastable mass by closing of the shutoff valve and prevent rapid deflagration or detonation of the metastable mass of the pyrophoric material. Semiconductor processing systems including the flow control arrangement and related flow control methods are also described.


Find Patent Forward Citations

Holbrook, Glenn. (2026). Flow control arrangements, semiconductor processing systems having flow control arrangements, and flow control methods (U.S. Patent No. 12753499). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12753499

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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