Method for controlling a flux distribution of evaporated source material, detector for measuring electromagnetic radiation reflected on a source surface and system for thermal evaporation with electromagnetic radiation

Abstract

The present invention relates to a method for controlling a flux distribution () of evaporated source material () in a system () for thermal evaporation with electromagnetic radiation (), wherein the system () comprises an electromagnetic radiation source () for providing an electromagnetic radiation (), a vacuum chamber () containing a reaction atmosphere () and a detector () for measuring electromagnetic radiation (), wherein a source material () and a target material () to be coated are arranged in the vacuum chamber () and the radiation source is arranged such that its electromagnetic radiation () impinges at an angle, preferably at an angle of 45°, on a source surface () of the source material () for a thermal evaporation and/or sublimation of the source material () below the plasma threshold, and wherein the detector () for measuring electromagnetic radiation () is arranged such that electromagnetic radiation () reflected on the source surface () reaches the detector (). Further, the present invention relates to a detector () for measuring electromagnetic radiation (), the detector () preferably suitable for a method according to the present invention, and additionally to a system () for thermal evaporation with electromagnetic radiation () suitable for the method according to the present invention.