The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 06, 2026

Filed:

Sep. 15, 2023
Applicant:

Fujifilm Corporation, Tokyo, JP;

Inventors:

Moe Narita, Shizuoka, JP;

Atsushi Mizutani, Shizuoka, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09K 13/06 (2006.01); B08B 3/08 (2006.01); C23F 1/30 (2006.01); H10P 70/00 (2026.01); H10W 20/44 (2026.01);
U.S. Cl.
CPC ...
C09K 13/06 (2013.01); B08B 3/08 (2013.01); C23F 1/30 (2013.01); H10P 70/27 (2026.01); H10W 20/4432 (2026.01);
Abstract

An object of the present invention is to provide a composition that leaves few residues in a case where the composition is brought into contact with a Ru-containing substance to perform an etching treatment on the Ru-containing substance, and to provide a method for treating a substrate. The composition according to an embodiment of the present invention contains one or more periodic acid compounds selected from the group consisting of a periodic acid and a salt thereof, a quaternary ammonium salt represented by Formula (A), and a trialkylamine or a salt thereof.


Find Patent Forward Citations

Narita, Moe. (2026). Composition and method for treating substrate (U.S. Patent No. 12753342). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12753342

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…