The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 2026
Filed:
Aug. 23, 2023
Meta Platforms Technologies, Llc, Menlo Park, CA (US);
Sheng Ye, Redmond, WA (US);
Abhirup Dutta, Storrs Mansfield, CT (US);
Hao Mei, Redmond, WA (US);
Lafe Joseph Purvis, II, Redmond, WA (US);
Arman Boromand, Issaquah, WA (US);
Jing Chen, Redmond, WA (US);
Andrew John Ouderkirk, Kirkland, WA (US);
Kristy Alana Jost, Woodinville, WA (US);
Meta Platforms Technologies, LLC, Menlo Park, CA (US);
Abstract
A polymer article includes an at least partially disentangled polyvinylidene fluoride (PVDF) family member composition and is characterized by an elastic modulus of at least 4 GPa and an electromechanical coupling factor (k) of at least 0.1 at room temperature. A method of manufacturing such a polymer article may include forming an at least partially disentangled polymer composition into a polymer thin film or fiber, applying a tensile stress to the polymer article in an amount effective to induce a stretch ratio of at least approximately 5 in the thin film or fiber, and applying an electric field across a thickness dimension of the polymer article. Annealing and poling steps may separately or simultaneously accompany and/or follow the act of stretching.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile