The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 06, 2026

Filed:

Jun. 20, 2022
Applicant:

Lg Chem, Ltd., Seoul, KR;

Inventors:

Gyunhyeok Ahn, Daejeon, KR;

Yoon Jae Min, Daejeon, KR;

Seul Ah Lee, Daejeon, KR;

Gicheul Kim, Daejeon, KR;

Hee Kwan Park, Daejeon, KR;

Kyunghoon Min, Daejeon, KR;

Assignee:

LG CHEM, LTD., Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 2/01 (2006.01); B01J 20/26 (2006.01); B01J 20/28 (2006.01); C08F 120/06 (2006.01);
U.S. Cl.
CPC ...
C08F 2/01 (2013.01); B01J 20/261 (2013.01); B01J 20/267 (2013.01); B01J 20/28047 (2013.01); C08F 120/06 (2013.01); B01J 2220/68 (2013.01);
Abstract

A continuous polymerization reactor for super absorbent polymer is disclosed. The continuous polymerization reactor includes a cylindrical body; a discharge part with a diameter decreasing downward, positioned at a lower part of the body; an inlet positioned at an upper part of and connected to the body, into which a monomer composition is introduced; an outlet positioned at a lower part of the discharge part, from which hydrogel polymer is discharged; and a discharge valve opening or closing the outlet, wherein a ratio (H1/D1) of a sum (H1) of a height of the body and a height of the discharge part to a diameter (D1) of the body is 2 to 4. In addition, a continuous polymerization reaction system comprising the continuous polymerization reactor is also disclosed.


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