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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12753112 B1

PDFFull Text
Date of Patent:
Oct. 06, 2026

Filed:

Feb. 20, 2023

Opaque quartz glass and method for producing the same

Applicant:

Tosoh Sgm Corporation, Yamaguchi, JP;

Inventors:

Manabu Sakurai, Yamaguchi, JP;

Minoru Kuniyoshi, Yamaguchi, JP;

Takayuki Kikuchi, Ibaraki, JP;

Yuta Shimasaki, Yamaguchi, JP;

Mori Bamba, Yamaguchi, JP;

Yuki Itoh, Yamaguchi, JP;

Assignee:

TOSOH SGM CORPORATION, Yamaguchi, JP;

Attorneys:

Mendelsohn Dunleavy, P.C.

Kevin J. Dunleavy

Primary Examiner:

Elizabeth A Bolden

Int. Cl.
CPC ...
C03C 11/00 (2006.01); C03B 19/06 (2006.01); C03C 3/06 (2006.01);
U.S. Cl.
CPC ...
C03C 11/00 (2013.01); C03B 19/063 (2013.01); C03B 19/066 (2013.01); C03C 3/06 (2013.01); C03C 11/007 (2013.01); C03B 2201/02 (2013.01); C03C 2204/04 (2013.01);
Abstract

An object of the present invention is to provide an opaque quartz glass containing pores with irregular shapes and having sufficient heat ray reflecting, heat ray blocking and light shielding properties, and further to provide a method for producing the opaque quartz glass. The opaque quartz glass of the present invention is an opaque quartz glass containing pores with irregular shapes dispersed in a glass body, wherein the opaque quartz glass has a pore size distribution of the pores having Dof 4 to 30 μm, a proportion of pores with pore sizes of 5 μm or less of 1 to 50%, and a proportion of pores with pore sizes of 15 μm or less of 30 to 90%, and an area ratio of pores in a microscopic image at a cross section of 5% or more. The opaque quartz glass of the present invention is obtained by mixing a plurality of types of the specific silica powders having different particle size distributions from each other at a predetermined formulation, and sintering a pressure-molded article of the mixed powder.

Find Patent Forward Citations

Sakurai, Manabu. (2026). Opaque quartz glass and method for producing the same (U.S. Patent No. 12753112). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12753112

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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