The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 2026
Filed:
Nov. 27, 2024
Screen Holdings Co., Ltd., Kyoto, JP;
Shinichi Taniguchi, Kyoto, JP;
Akihiro Iwasaki, Kyoto, JP;
SCREEN Holdings Co., Ltd., Kyoto, JP;
Abstract
A substrate processing system including a rotation mechanism that controls a lifter to collectively immerse a plurality of substrates whose orientation has been changed into a vertical orientation in a batch processing tank to perform first batch processing, controls the lifter to collectively immerse the plurality of substrates whose orientation has been changed into the vertical posture in the batch processing tank to perform second batch processing, and rotates the substrates about a normal line of the substrates, wherein, after the first batch processing and before the second batch processing, the rotation mechanism is controlled such that the second batch processing is performed with the orientation of the substrates being vertically inverted with respect to the orientation of the substrates in the first batch processing.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile