The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 29, 2026
Filed:
Aug. 12, 2024
Samsung Electronics Co., Ltd., Suwon-si, KR;
Geunsik Oh, Suwon-si, KR;
Sang-Yoon Kim, Suwon-si, KR;
Sung-Ki Lee, Suwon-si, KR;
Myung-Sung Kang, Suwon-si, KR;
Jin-Woo Park, Suwon-si, KR;
Samsung Electronics Co., Ltd., Suwon-si, KR;
Abstract
A device for removing a void in an underfill material is described. The device includes a chamber configured to accept a substrate applied with an underfill material therein; a gas supply device connected to the chamber and configured to inject a heated gas into the chamber to create a heating atmosphere and a pressurizing atmosphere inside the chamber; and a vacuum device connected to the chamber and configured to exhaust a gas to the outside of the chamber to create a vacuum atmosphere inside the chamber. The vacuum device and the gas supply device are configured to alternately operate once during each cycle of one or more cycles to create the vacuum atmosphere and the pressurizing atmosphere inside the chamber, and during each cycle of the one or more cycles, the vacuum device and the gas supply device are configured to alternately operate once. Related methods are also described.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile