The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 29, 2026
Filed:
Jul. 30, 2024
Applicant:
Vm Inc., Icheon-si, KR;
Inventors:
Hwi Gon Jang, Yongin-si, KR;
Woo Hyung Choi, Seongnam-si, KR;
Byeong Jun Jung, Icheon-si, KR;
Jin Myeong Lee, Yongin-si, KR;
Assignee:
VM INC., Icheon-si, KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H10P 72/00 (2026.01);
U.S. Cl.
CPC ...
H10P 72/0406 (2026.01); H10P 72/0408 (2026.01); H10P 72/00 (2026.01); H10P 72/0414 (2026.01);
Abstract
An apparatus for removing a residual gas on a wafer comprises at least one spraying nozzle disposed at a front of a loading volume formed within a housing and extending linearly along a horizontal direction respectively; and a plurality of spraying holes formed at each spraying nozzle along the extending direction of each spraying nozzle, wherein the residual gas or a contaminating matter on a surface of the wafer is removed by a gas or a CDA (Clean Dry Air) sprayed through the plurality of the spraying holes.