The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 29, 2026
Filed:
Jul. 07, 2023
Applicant:
Asm Ip Holding, B.v., Almere, NL;
Inventors:
Timothee Blanquart, Oud-Heverlee, BE;
René Henricus Jozef Vervuurt, Leuven, BE;
Shaoren Deng, Ghent, BE;
Assignee:
ASM IP Holding B.V., Almere, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10P 50/00 (2026.01); H10P 14/60 (2026.01); H10P 50/28 (2026.01); H10P 76/20 (2026.01); H10W 20/00 (2026.01);
U.S. Cl.
CPC ...
H10P 50/73 (2026.01); H10P 14/6304 (2026.01); H10P 14/6319 (2026.01); H10P 14/6336 (2026.01); H10P 14/6339 (2026.01); H10P 50/285 (2026.01); H10P 76/20 (2026.01); H10W 20/096 (2026.01); H10W 20/098 (2026.01);
Abstract
Disclosed are methods and related systems for topography-selective depositions. Embodiments of presently described methods comprise employing a sacrificial gap filling fluid for selectively forming a material on a distal surface of a gap, and not on at least one of sidewalls of the gap and proximal surfaces. Further described are methods for filling a gap with a high quality material by means of a sacrificial gap filling fluid.