The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 29, 2026

Filed:

Dec. 06, 2022
Applicant:

Excillum Ab, Kista, SE;

Inventors:

Per Takman, Kista, SE;

Tomi Tuohimaa, Kista, SE;

Ulf Lundström, Kista, SE;

Assignee:

EXCILLUM AB, Kista, SE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05G 1/52 (2006.01); H01J 35/06 (2006.01); H01J 35/14 (2006.01);
U.S. Cl.
CPC ...
H05G 1/52 (2013.01); H01J 35/066 (2019.05); H01J 35/147 (2019.05); H01J 2235/06 (2013.01);
Abstract

There is provided an X-ray source comprising an electron source for providing an electron beam, the electron source comprising a cathode, a Wehnelt, and an anode; an electron optic arrangement configured to deflect and focus the electron beam towards a target for generation of X-ray radiation; an arrangement for determining a quantity indicative of a width of the electron beam; and a controller configured to compute a quantity dependent on a divergence of the electron beam at an entrance of the electron optic arrangement based on the quantity indicative of a width of the electron beam; and apply a bias voltage to the Wehnelt such that the quantity dependent on the divergence of the electron beam at the entrance of the electron optic arrangement is adjusted towards a desired value. A corresponding method is also provided.


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