The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 29, 2026
Filed:
Aug. 27, 2024
Oracle International Corporation, Redwood Shores, CA (US);
Kirk Bradley, San Francisco, CA (US);
Ruixian Liu, Shijiazhuang, CN;
Kenny C. Gross, Escondido, CA (US);
Oracle International Corporation, Redwood Shores, CA (US);
Abstract
Systems, methods, and other embodiments associated with ensuring that detection of degraded signals is not able to be masked by degradation in other signals are described. In one example embodiment, a method accesses a multivariate machine learning model that is trained to monitor a set of time series signals and a test observation of the signals has a degradation on an m-th signal. A baseline bias for the m-th signal is determined using the test observation and a model-estimated value of the m-th signal. A Jacobian matrix of the model is generated based on a finite difference smaller than an observed value of the m-th signal. A masking bias is determined based on the baseline bias and a next K largest entries of an m-th row of the Jacobian matrix. And, the degradation is certified to be un-maskable or not based on the masking bias and the finite difference.