The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 29, 2026
Filed:
Jan. 27, 2022
Hoya Lens Thailand Ltd., Pathumthani, TH;
Shohei Matsuoka, Tokyo, JP;
HOYA LENS THAILAND LTD., Pathumthani, TH;
Abstract
Provided is a technology that makes a change in the amount of aberration that is a combination of aberration in an eye and aberration in a spectacle lens robust with respect to rotation. Provided are a method for designing a spectacle lens and related technologies in which, when rotational asymmetry of an aberration distribution of an eye of a wearer about an optical axis is strong, a spectacle lens that has an aberration distribution of which rotational asymmetry is weak in a region having a predetermined width and a center at any point on a main meridian of the spectacle lens is obtained as a design solution, and when rotational asymmetry of the aberration distribution of the eye of the wearer about the optical axis is weak, a spectacle lens of which rotational asymmetry is strong in the region is obtained as a design solution.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile