The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 29, 2026

Filed:

Jan. 22, 2024
Applicants:

SK Innovation Co., Ltd., Seoul, KR;

SK Earthon Co., Ltd., Seoul, KR;

Inventors:

Seungjoon Cha, Daejeon, KR;

Hee Jeong Jang, Daejeon, KR;

Youngki Choi, Daejeon, KR;

Kyoung Jin Lee, Daejeon, KR;

Man Cheol Kim, Gyeonggi-do, KR;

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01V 20/00 (2024.01); E21B 44/00 (2006.01);
U.S. Cl.
CPC ...
G01V 20/00 (2024.01); E21B 44/00 (2013.01); E21B 2200/20 (2020.05); E21B 2200/22 (2020.05);
Abstract

Disclosed are a method and apparatus for estimating lithofacies by learning well logs. The method includes a model formation step of forming lithofacies estimation model to output lithofacies corresponding to measured depth when the well logs are input based on train data sets including train data having values of multiple factors included in the well logs, the values being arranged corresponding to measured depth, and label data having lithofacies corresponding to measured depth as answers, and lithofacies estimation step of inputting unseen data having values of multiple factors included in well logs acquired from a well at which lithofacies are to be estimated, the values being arranged corresponding to measured depth, to the lithofacies estimation model to estimate lithofacies corresponding to measured depth.


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