The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 29, 2026
Filed:
Jul. 01, 2021
Hitachi High-tech Corporation, Tokyo, JP;
HITACHI HIGH-TECH CORPORATION, Tokyo, JP;
Abstract
A nanopore with a high yield and an appropriate size is formed. Thus, the present disclosure proposes a nanopore formation method for forming a nanopore in a membrane, the method including: introducing an aqueous solution at a first pH into a first solution tank and a second solution tank insulated by the membrane; securing hydrophilicity of a surface of the membrane; replacing the aqueous solution at the first pH in the first solution tank and the second solution tank with an aqueous solution at a second pH lower than the first pH after the hydrophilicity of the surface of the membrane is secured; and immersing an electrode in each of the first solution tank and the second solution tank containing the aqueous solution at the second pH to cause dielectric breakdown and form a nanopore in the membrane (see FIG.).