The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 29, 2026

Filed:

May. 18, 2023
Applicant:

Korea Institute of Science and Technology, Seoul, KR;

Inventors:

Bok Ryul Yoo, Seoul, KR;

Dae Jin Kim, Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C01B 33/141 (2006.01);
U.S. Cl.
CPC ...
C01B 33/141 (2013.01); C01P 2004/04 (2013.01); C01P 2004/62 (2013.01); C01P 2004/64 (2013.01);
Abstract

Disclosed is a method of preparing colloidal silica, more particularly a method of producing high-concentration (10-55 wt %) colloidal silica by reacting water with a tetraalkyl orthosilicate (TMOS), tetraethyl orthosilicate (TEOS) based silane precursor as a starting material in the presence of a basic catalyst.


Find Patent Forward Citations

Yoo, Bok. (2026). Method of preparing high-concentration colloidal silica (U.S. Patent No. 12747161). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12747161

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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