The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 29, 2026

Filed:

Nov. 01, 2022
Applicant:

Lam Research Corporation, Fremont, CA (US);

Inventors:

Aleksey V. Altecor, Newberg, OR (US);

Andrew Borth, Newberg, OR (US);

Erica Sakura Strandberg Pohl, Sherwood, OR (US);

Chi-Jung Cheng, Wilsonville, OR (US);

Assignee:

Lam Research Corporation, Fremont, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 5/00 (2006.01); B01D 53/00 (2006.01);
U.S. Cl.
CPC ...
B01D 5/0051 (2013.01); B01D 5/0036 (2013.01); B01D 5/0042 (2013.01); B01D 5/006 (2013.01); B01D 53/002 (2013.01); B01D 2221/14 (2013.01);
Abstract

A gas separator includes a first distillation chamber and an evaporation chamber. A first liquid valve comprises an inlet in fluid communication with the first distillation chamber and an outlet in fluid communication with the evaporation chamber. A chiller is configured to chill the first distillation chamber to a first temperature and the evaporation chamber to a second temperature that is different than the first temperature. The gas separator operates a first mode during which distillation a gas mixture is received by the first distillation chamber, the gas mixture is separated into a first condensed liquid and a first separated gas mixture, and the separated gas is output by the first distillation chamber. During a second mode, the first liquid valve transfers the first condensed liquid to the evaporation chamber and the first distillation does not receive the gas mixture and does not supply the first separated gas mixture.


Find Patent Forward Citations

Quick Actions:

Altecor, Aleksey. (2026). Compact in-situ gas separator for substrate processing systems (U.S. Patent No. 12746485). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12746485

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