The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 22, 2026
Filed:
Feb. 16, 2023
Applicant:
Kokusai Electric Corporation, Tokyo, JP;
Inventors:
Tsuyoshi Takeda, Toyama, JP;
Daisuke Hara, Toyama, JP;
Assignee:
Kokusai Electric Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); H10P 72/76 (2026.01);
U.S. Cl.
CPC ...
H01J 37/3211 (2013.01); H01J 37/32119 (2013.01); H01J 37/32174 (2013.01); H01J 37/32568 (2013.01); H01J 37/32651 (2013.01); H01J 37/321 (2013.01); H01J 37/32183 (2013.01); H01J 37/3244 (2013.01); H10P 72/7612 (2026.01);
Abstract
According to one aspect of the technique of the present disclosure, there is provided a substrate processing apparatus including: a process chamber in which a substrate is processed; a gas supplier through which a process gas is supplied to the process chamber; a plasma generator provided so as to protrude into the process chamber, constituted by a coil and an insulator, and configured to generate a plasma of the process gas in the process chamber; and an adjuster capable of adjusting a gap distance between the coil and the insulator.