The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 22, 2026
Filed:
Dec. 08, 2022
Bmc Medical Co., Ltd., Beijing, CN;
BMC MEDICAL CO., LTD., Beijing, CN;
Abstract
A virtual wearing method for a mask includes: acquiring a facial image of a user; determining actual facial feature data according to the facial image; determining and displaying one or more matched first masks of various models according to the actual facial feature data; determining a target mask from the first masks according to received first input from the user; and generating wearing picture information according to the facial image and the target mask, and displaying the wearing picture information. It can not only accurately match a plurality of first masks of different types and sizes suitable for the facial features of the user according to the facial feature data of the user, but also generate and display the wearing picture information through virtual reality and other technologies, so as to simulate the effect of the user wearing the target mask.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile