The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 22, 2026
Filed:
Jun. 05, 2020
Advanced Micro-fabrication Equipment Inc. China, Shanghai, CN;
ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA, Shanghai, CN;
Abstract
Disclosed is a heating apparatus for heating a rotatable wafer susceptor so as to improve temperature uniformity of various zones of the top surface of the wafer susceptor. The wafer susceptor has a rotation axis; the heating apparatus is disposed beneath the wafer susceptor and vertically spaced a distance from the wafer susceptor. The heating apparatus includes one or more first heaters and a plurality of auxiliary heaters. The one or more first heaters are configured to heat ring-shaped zones of the wafer susceptor above, the plurality of auxiliary heaters are disposed beneath the ring-shaped zones, and the plurality of auxiliary heaters have different distances from the rotation axis so as to adjust a local temperatures in the ring-shaped zones.