The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 22, 2026
Filed:
Jan. 05, 2024
Applicant:
Ycchem Co., Ltd., Seongju-gun, KR;
Inventors:
Deok Su Han, Seoul, KR;
Hwan Chul Kim, Seoul, KR;
Seung Chul Hong, Seoul, KR;
Han Teo Park, Seoul, KR;
Assignee:
YCCHEM CO., LTD., Seongju-gun, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09G 1/02 (2006.01); C09G 1/00 (2006.01); C09G 1/04 (2006.01); C09K 3/14 (2006.01); H10P 52/40 (2026.01); H10P 95/00 (2026.01);
U.S. Cl.
CPC ...
C09G 1/02 (2013.01); C09G 1/00 (2013.01); C09G 1/04 (2013.01); C09K 3/1409 (2013.01); C09K 3/1454 (2013.01); C09K 3/1463 (2013.01); H10P 52/402 (2026.01); H10P 52/403 (2026.01); H10P 95/062 (2026.01);
Abstract
A polishing composition for a semiconductor process includes polishing particles. The polishing particles have a Ds value of 700 nmto 1400 nmaccording to Equation 1 below;
Han, Deok. (2026). Polishing composition for semiconductor process and method for polishing a substrate using the same (U.S. Patent No. 12742096). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12742096
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile