The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 22, 2026

Filed:

Feb. 19, 2024
Applicant:

Darwin Precisions Corporation, Hsinchu County, TW;

Inventor:

Chi Ying Lu, Hsinchu County, TW;

Assignee:

DARWIN PRECISIONS CORPORATION, Hsinchu County, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A45D 44/00 (2006.01); A61K 8/02 (2006.01); A61M 37/00 (2006.01);
U.S. Cl.
CPC ...
A45D 44/002 (2013.01); A61K 8/0212 (2013.01); A61M 37/0015 (2013.01); A61M 2037/0061 (2013.01);
Abstract

A compound facial mask includes a flexible body, a discharge pattern, and a microneedle portion. The discharge pattern is positioned on the surface of the flexible body. The discharge pattern includes two metals, and the two metals have different redox potentials. The microneedle portion is positioned on the surface of the flexible body, prepared from a material different from the discharge pattern and provided with a plurality of conductive microneedles. By adopting the compound facial mask, absorption by the skin of a user can be promoted, and the absorption rate of ingredients in a liquid used in cooperation with the compound facial mask is increased.


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