The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 15, 2026
Filed:
Jan. 27, 2023
Screen Holdings Co., Ltd., Kyoto, JP;
Kazuki Nishihara, Kyoto, JP;
Yuya Akanishi, Kyoto, JP;
SCREEN Holdings Co., Ltd., Kyoto, JP;
Abstract
An etching method according to the present invention includes a step of creating a reduced pressure state inside of a processing chamber accommodating a substrate, after the step of creating the reduced pressure state, a step of supplying vapor into the processing chamber, after the step of creating the reduced pressure state, a step of supplying an etching gas containing hydrogen fluoride into the processing chamber and etching the coating film formed on the substrate, and in the step of supplying the vapor, a step of detecting OH stretching vibration in the substrate by infrared spectroscopy, in which the step of etching the coating film is performed when the OH stretching vibration of a predetermined threshold value or higher is detected in the substrate. Therefore, the efficiency of the etching process is enhanced.