The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 15, 2026

Filed:

Dec. 01, 2022
Applicant:

Zeon Corporation, Tokyo, JP;

Inventor:

Tsutomu Fujii, Tokyo, JP;

Assignee:

ZEON CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01M 4/04 (2006.01); B05C 5/02 (2006.01); B05C 11/02 (2006.01); H01M 4/02 (2006.01);
U.S. Cl.
CPC ...
H01M 4/0435 (2013.01); B05C 5/0245 (2013.01); B05C 11/025 (2013.01); H01M 4/0404 (2013.01);
Abstract

A production apparatus of an electrode active material layer, comprising: a support unit; a feeding unit feeding prescribed granulated particles on or above the support unit; a first conveying unit; a squeegee unit; a first stock guide; a second stock guide; a first position measurement unit; a second position measurement unit; a rolling unit; a first gap adjustment unit; a second gap adjustment unit; and a control unit. The first position measurement unit measures a distance D. The second position measurement unit measures a distance D. The control unit causes the first gap adjustment unit to adjust a gap Gbased on a difference between the gap Gobtained based on the distance Dand a gap threshold Tand causes the second gap adjustment unit to adjust a gap Gbased on a difference between the gap Gobtained based on the distance Dand a gap threshold T


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