The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 15, 2026
Filed:
Mar. 11, 2022
Sekisui Chemical Co., Ltd., Osaka, JP;
Eiji Miyamoto, Kyoto, JP;
Masato Akahori, Kyoto, JP;
Hideki Kondo, Kyoto, JP;
Mamoru Hino, Kyoto, JP;
SEKISUI CHEMICAL CO., LTD., Osaka, JP;
Abstract
The adhesiveness of a treatment target made of a fluorine-based hard-to-adhere material is improved. A process gas containing any one or two or more among carbon monoxide, carbon dioxide, hydrogen, water vapor, ethanol, propanol, hexanol, ethylene glycol, and ammonia is supplied from a process gas supply unitto a plasma generation unit. In the plasma generation unit, the process gas is activated by plasma and is brought into contact with a treatment target, and through a reaction caused by the contact, the residual ratio of fluorine atoms on a surface of the treatment targetis adjusted to 60% or less of that before the contact, and any one among a carbon atom, a hydrogen atom, and an oxygen atom, or a molecule containing one or more of these atoms is provided to the surface of the treatment target.