The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 15, 2026

Filed:

Jun. 10, 2024
Applicant:

Toto Ltd., Kitakyushu, JP;

Inventors:

Yasutaka Nitta, Kitakyushu, JP;

Takuma Wada, Kitakyushu, JP;

Ryoto Takizawa, Kitakyushu, JP;

Assignee:

Toto Ltd., Fukuoka, JP;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 16/458 (2006.01); H10P 72/00 (2026.01); H10P 72/72 (2026.01); H10P 72/76 (2026.01);
U.S. Cl.
CPC ...
H01J 37/32477 (2013.01); C23C 16/4583 (2013.01); H01J 37/32715 (2013.01); H10P 72/04 (2026.01); H10P 72/72 (2026.01); H10P 72/7616 (2026.01); H01J 2237/2007 (2013.01);
Abstract

According to one embodiment, a semiconductor manufacturing apparatus member includes a base and a particle-resistant layer. The base includes a first surface, a second surface crossing the first surface, and an edge portion connecting the first surface and the second surface. The particle-resistant layer includes a polycrystalline ceramic and covering the first surface, the second surface, and the edge portion. The particle-resistant layer includes a first particle-resistant layer provided at the edge portion, and a second particle-resistant layer provided at the first surface. A particle resistance of the first particle-resistant layer is higher than a particle resistance of the second particle-resistant layer. A thickness of the first particle-resistant layer is thinner than a thickness of the second particle-resistant layer.


Find Patent Forward Citations

Nitta, Yasutaka. (2026). Semiconductor manufacturing apparatus (U.S. Patent No. 12738460). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12738460

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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