The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 15, 2026
Filed:
Aug. 17, 2024
Applicant:
Yang Pan, Singapore, SG;
Inventor:
Yang Pan, Singapore, SG;
Assignee:
Inspiring Atoms Pte Ltd, Singapore, SG;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/24 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/243 (2013.01); H01J 37/3299 (2013.01); H01J 2237/2007 (2013.01);
Abstract
Disclosed herein is a real-time control and optimization system for a plasma process system, specifically focusing on a tailored waveform generator coupled to a chuck. The system employs a system controller that divides the process recipe into a setting phase and a processing phase. The setting phase is used to determine optimized slopes for voltage waveforms during plasma processing. This innovation enhances the precision and consistency of ion energy and current during plasma etching and related processes.