The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 15, 2026

Filed:

Feb. 18, 2022
Applicant:

Hitachi High-tech Corporation, Tokyo, JP;

Inventors:

Akito Tanokuchi, Tokyo, JP;

Hiroki Tsubouchi, Tokyo, JP;

Hiroyuki Andou, Tokyo, JP;

Takao Ubukata, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/18 (2006.01); H01J 37/20 (2006.01); H01J 37/285 (2006.01);
U.S. Cl.
CPC ...
H01J 37/18 (2013.01); H01J 37/20 (2013.01); H01J 37/285 (2013.01); H01J 2237/006 (2013.01); H01J 2237/186 (2013.01);
Abstract

The purpose of the present disclosure is to provide a vacuum processing device that switches the rate of pressure variation depending on, e.g., the type of an object to be inspected, thereby making it possible to ensure operation reliability during inspection of a fragile object to be inspected, while preventing a decrease in throughput. The vacuum processing device according to the present disclosure comprises a preliminary exhaust chamber for the transfer of a sample between a sample chamber and the external air. The conductance of a pipe for ventilating the preliminary exhaust chamber is varied in accordance with a parameter corresponding to the fragility of a shape pattern formed on the sample (see FIG.).


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