The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 15, 2026

Filed:

Sep. 18, 2023
Applicant:

Headway Technologies, Inc., Milpitas, CA (US);

Inventors:

Haowen Ren, Fremont, CA (US);

Weihao Xu, San Jose, CA (US);

Yuxuan Xiao, Milpitas, CA (US);

Shehrin Sayed, Fremont, CA (US);

Yue Liu, Fremont, CA (US);

Yan Wu, Cupertino, CA (US);

Yuhui Tang, Milpitas, CA (US);

Assignee:

Headway Technologies, Inc., Milpitas, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11B 5/23 (2006.01);
U.S. Cl.
CPC ...
G11B 5/23 (2013.01);
Abstract

The present embodiments relate to a write head design with a patterned hot seed (HS). Particularly, the HS can be patterned as part of a multi-step patterning process that can partially or completely remove portions of the HS at multiple sides to form various designs. For example, the HS can have a two-step cliff design, etching multiple steps around an un-patterned center portion, and a flared angle. The designs of the patterned HS can improve write head performance.


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